Confocal magnetron sputtering

Confocal magnetron sputtering

Confocal magnetron sputtering is now routinely employed for the production of excellent uniformity, multi-layer films by magnetron sputtering. This application note describes the technology, and explains the principles behind it.

Source selection for thermal evaporation

Thermal evaporation sources

Thermal evaporation sources A thermal evaporation (TE) component typically consists of power supply rods, usually fashioned from thick copper, mounted to feedthroughs that allow transmission of current from an air-side power supply network through to a high-vacuum process chamber. Clamped between the power legs is a resistive support on which the material to be evaporated […]

A high speed PE-ALD ZnO Schottky diode rectifier with low interface-state density

Jin, J., et al. Journal of Physics D: Applied Physics 2018 DOI: 10.1086/1361-6463/aaa4a2 The authors report the fabrication of high-speed Schottky diode rectifiers from zinc oxide, with PtOx Schottky contacts. For this, ZnO was deposited using PE-ALD, while metal and PtOx contacts were produced by RF sputtering using a Moorfield nanoPVD-S10A system, including in reactive sputtering mode […]

New product: nanoPVD-T15A for benchtop organic films deposition!

The latest in the nanoPVD range, model T15A can be fitted with LTE sources for deposition of organic films for OPV, OLED and OFET research. With the further capability for metals deposition and a wide range of options, this state-of-the-art R&D tool is ideal for creating organic films and contact electrodes for complete working devices!

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