New dedicated sputter targets site launched

Sputter targets

Due to steadily increasing demand, Moorfield have released a new standalone website just for sputter targets! As industry leaders in high-vacuum PVD, CVD, and etch systems, we can offer a huge range of sputtering targets, as well as expert advice and guidance for your project. The new site showcases some of the most popular targets […]

Confocal magnetron sputtering

Confocal magnetron sputtering

Confocal magnetron sputtering is now routinely employed for the production of excellent uniformity, multi-layer films by magnetron sputtering. This application note describes the technology, and explains the principles behind it.

PVD techniques

nanoPVD-T15A chamber interior with two TE1 sources for metals evaporation

Moorfield are experienced in all common PVD techniques and can supply systems with fully-integrated component sets. Standalone components also available.

Magnetron sputtering

Magnetron sputtering

Magnetron sputtering is a versatile technique suited to a wide range of materials – and provides excellent coating-substrate adhesion.

Low temperature evaporation

Physical Vapour Deposition

The basics of Vacuum Evaporation Low temperature evaporation is a recent development in the field of vacuum evaporation. Traditional vacuum evaporation methods work, essentially, by heating materials to high temperatures. This is required for common thin-film evaporants so that they are vapourised from a source. The evaporants then move up through a process chamber to […]

Thermal evaporation

Thermal evaporation

Thermal evaporation is the most straightforward physical vapour deposition (PVD) technique, in terms of both mechanism and system configuration. The method is suitable for depositing a range of materials, primarily metals. 

On the road again

This June, Moorfield will be touring the Benelux territories with local representative ST Instruments. In the back of the van will be a working nanoPVD-S10A system!

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