Alumina crucible for LTE-1CC source (2.4 CC). Supplied singly or in packs of 5.
High-vacuum magnetron sputtering head for industry-standard 4″ diameter targets. Accepts target thicknesses from 1/16″ to 1/4″. Easy target replacement and maintenance.
High-vacuum magnetron sputtering head for industry-standard 3″ diameter targets. Accepts target thicknesses from 1/16″ to 1/4″. Easy target replacement and maintenance.
200 A/5 V transformer circuit for thermal evaporation sources. Note that for optimal performance, power supply should be matched to source types to be used.
High-vacuum magnetron sputtering head for industry-standard 2″ diameter targets. Accepts target thicknesses from 1/16″ to 1/4″. Easy target replacement and maintenance.
100 A/10 V transformer circuit for thermal evaporation sources. Note that for optimal performance, power supply should be matched to source types to be used.
Single 1″ bolt baseplate feedthrough for providing power for thermal evaporation sources. Rated for 400 A/50 V continuous operation. Fitted for water cooling.
New Chinese distribution partner
Moorfield Nanotechnology have recently appointed a distributor in China for their PVD, CVD, and etch systems.
Moorfield Nanotechnology Limited. Unit 1 Wolfe Close, Parkgate Industrial Estate, Knutsford, Cheshire, United Kingdom. WA16 8XJ.
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