Thermal evaporation

Thermal evaporation is a straightforward means of thin film deposition with materials being heated to evaporation temperatures via a resistively heated support.

Thermal evaporation is best suited to metals with evaporation temperatures of about 1700 °C or below. Moorfield’s MiniLab range is ideally suited to the thermal evaporation technique.

Thermal evaporation products

Edwards e306
Edwards e306
Moorfield have been working with the Edwards E306 system for more than 2 decades.
MiniLab 026
MiniLab 026
MiniLab 026 systems are compact floor standing vacuum evaporators with easy-access ‘clam-shell’ chambers. Suitable for metal, dielectric and organics deposition via evaporation and sputtering techniques.
MiniLab 060
The most popular platform in our MiniLab range, MiniLab 060 systems have front-loading box-type chambers ideal for multiple-source magnetron sputtering but also thermal and e-beam evaporation.
MiniLab 080
MiniLab 080
MiniLab 080 systems offer tall chambers ideally suited for thermal, LTE and e-beam evaporation techniques requiring longer working distances for optimum uniformity.
MiniLab 090
MiniLab 090
MiniLab 090 systems are glovebox-compatible for atmosphere-sensitive applications. Tall chambers are ideal for high-performance evaporation, but magnetron sputtering is also available.
MiniLab 125
MiniLab 125
MiniLab 125 tools take the modular concept to the pilot-scale level. Large chambers allow for increased-size component sets for coating large areas, and a range of load-lock options enable high-throughput operation. At the same time, systems are fully cust
nanoPVD-ST15A
nanoPVD-ST15A
Model ST15A offers the combination of evaporation and sputtering techniques within a single process chamber. Ultimate research flexibility within a benchtop, automated package.
nanoPVD-T15A
nanoPVD-T15A
High-performance metals, organic evaporation in compact packages for benchtop location. Superior, efficient performance and ideal for OLED, OPV and OFET research.

Knowledge base articles about Thermal evaporation

Knowledge base

Thermal evaporation sources
Source selection for thermal evaporation

Knowledge base

nanoPVD-T15A chamber interior with two TE1 sources for metals evaporation
PVD techniques
Moorfield are experienced in all common PVD techniques and can supply systems with fully-integrated component sets. Standalone components also available….

Knowledge base

Physical Vapour Deposition
Low temperature evaporation

Knowledge base

Thermal evaporation
Thermal evaporation
Thermal evaporation is the most straightforward physical vapour deposition (PVD) technique, in terms of both mechanism and system configuration. The method is suitable for depositing a range of materials, primarily metals. …

Knowledge base

E-Beam featured
Electron-beam evaporation
Like all evaporative physical vapour deposition (PVD) methods, electron-beam evaporation (also known as e-beam evaporation) involves heating a material under vacuum conditions (typically in the 10-7 mbar region, or lower). This in-turn releases a vapour that moves up through a process chamber and coats a substrate at the top….

Recent news about Thermal evaporation

nanoPVD-T15A
Moorfield’s nanoPVD range goes from strength to strength
Four recent installations in London, Sweden, and Norway…
Strong Interest in nanoPVD-T15A

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