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Where high etch rates are required for sample cleaning and preparation, the user may select
higher beam current and/ or beam energy levels from the AS3000V.
The source is focusable down to a spot size of circa 5mm (
dependant upon working distance) or it may be broadened out for
flood cleaning and etching.
Technical Specification:
Source type: Hot filament oscillating electron discharge
source. Twin filaments for extended service interval, user
replaceable.
Feed Gas: Inert gases
Gas Inlet: NW19 conflat port at ground potential. Precision leak
valve required ( better than 5 x 10-7E mbar across seal). Purge
line and purifier recommended.
Cooling: No source cooling required
Lifetime: Typically 3 months for filament replacement, 12 months
for source strip and clean.
Pumping: No special pumping required. Typical analysis chamber
pressure 1 x 10-5E mbar
Source lens: Extractor/ accelerator lens design.
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Mechanical specification:
Working distance: 100mm +/- 50mm
Flange to sample: 250 mm +/- 50mm
Mounting flange: NW35 conflat
Electrical feed throughs: 10 way military spec plug
Minimum port i/d: 37mm
Construction: all UHV compatible stainless steel
Bakeout temperature: 200 deg C
Orientation: any
Control and power unit:
19 inch rack mount painted steel box, 3U height
115 VAC or 230 VAC selectable
Filament: 0-3A
Discharge: 20mA - 100mA variable.
Beam potential: Continuously variable between c200eV and 3000eV
Extractor: 0-3000 V continuously variable.
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PRICE
| Description |
Order Code |
Price (UKŁ) |
Price (US$) |
Price (Euro) |
| Package |
AS3000P |
7,500 |
12,750 |
12,375 |
| Source only |
AS3000S |
3,500 |
5,950 |
5,775 |
| Control Unit |
AS3000PSU |
4,265 |
7,250 |
7,037 |
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